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Vacuum Chuck Hot Plates

Controlled and monitored through a flexible conduit, using a remote control box

200, 250 or 300°C

THERMANSYS designed its entire Vacuum Chuck Heated Plates family to offer precise and uniform surface temperature control. Featuring a perforated  plate on top of the heated body, this design allows for air suction through the holes, ensuring uniform attachment of the heat-treated substrate to the heated surface and significantly enhancing heat transfer. These plates are an ideal choice for heating thin film substrates, wafers, or flexible membranes.

Vacuum Chuck Hot Plates
Max Temperature 200°C
Vacuum Chuck Hot Plates
Max Temperature 200°C
Vacuum Chuck Hot Plates
Max Temperature 250°C
Vacuum Chuck Hot Plates
Max Temperature 300°C